Features of the structure of TiN films after irradiation with nitrogen
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Nitrides, especially titanium nitride (TiN) and aluminum nitride (AlN) are studied for their significant characteristics. But there are many problems of synthesis like microparticulation and synthesis time, cost reduction. A new method to synthesize TiN and A1N through electrical wire explosion of titanium wire and aluminum wire in liquid nitrogen is proposed. In this process, high-purity and nano-sized nitrides is recovered in a short time. In this investigation, the details of the method of wire explosion and some analytical results for recovered powders are described. Under a moderate condition, TiN and A1N powders were successfully recovered.
Liquid nitrogen
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A feasibility study of applying titanium-nitride (TiN) coating onto waste package surfaces was performed as part of efforts to enhance the long-term performance of high-level waste packages. The hypothesis examined in the study is that a successful TiN coating would provide an effective mass-transport barrier thus preventing corrosion. In the present work, single-layer TiN and multiple-layer TiN + Ti, TiN + Ti + TiN, and ZrO2 + TiN were deposited on Type 316L stainless steel substrates. The coated samples were tested for corrosion properties in different types of water using polarization and weight loss tests. Results of corrosion testing are presented and discussed.
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The characteristics of ionized metal plasma PVD Ti-TiN films have been investigated for the application as a liner for small deep contacts. Compared to collimated Ti-TiN films, the bottom coverage of IMP Ti-TiN is more than two times higher at high aspect ratio contacts. With substrate bias, IMP Ti and IMP TiN show different crystallographic orientation behaviour. When applied to deep contacts, excellent contact resistance was achieved with thinner IMP Ti films, which is only one third of the thickness of collimated Ti films. Adopting the IMP TiN liner also represents a lower contact resistance than collimated TiN liners.
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Titanium nitride (TiN) coating has excellent properties and has been already used in the various field of industry. But TiN film has problems in the formation process: i.e., low deposition rate and poor thickness of the film. TiN thick coatings can be formed by means of the gas tunnel type plasma reactive spraying in a short time operation. In this study, the fundamental characteristics of this method were investigated by measuring the properties of the titanium nitride (TiN) coatings formed on the traversed stainless steel substrate. Consequently, TiN coatings of 200µm thickness were obtained at P=27kW, within t=5s, and some coating characteristics which depend on the spraying distance, the environmental gas, traverse number etc. were clarified. And the performance of TiN thick composite coating was discussed as a heat resistant TBC.
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Titanium nitride (TiN) coatings have been prepared on cemented carbides in DC-PCVD equipment made by ourselves. The micro-structure, composition, crosssection and hardness of the TiN coatings, as well as the influence of process parameters on them,have been studied. It is found that at the temperature from 500℃ to 700℃, the deposited TiN coating is single phase compact TiN with a hardness of Hv 21 560N/mm2 ;under a batch of 500 bit tools, the properties of TiN coatings deposited on different bits are uniform. It makes the PCVD technique possible for batch production.
Cemented carbide
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Abstract The main idea of the presented work is the evaluation of frictional properties of the TiN coatings deposited by atomic layer deposition technology using atomic force microscopy approach. Ogletree method was employed in order to calibrate the lateral force and estimate the average friction coefficient of TiN coatings. Obtained titanium nitride coatings were also characterized in terms of morphology, surface topography and mechanical properties. The evaluation has been done with reference to the commercially available TiN produced by commonly known magnetron sputtering method.
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