Effect of Film Thickness on the Properties of Al Doped ZnO Thin Films

The ZnO:Al(ZAO) films with different thickness were deposited on glass substrates using a DC reactive magnetron sputtering system and the thickness dependence of structural,electrical and optical properties of the ZAO films were studied in detail.The ZAO thin film was prepared by using the optimum parameter,and it can be acquired that the film thickness was about 500 nm,the resistivity was 1.68×10-3 Ω·cm and the transmissivity in visible region was about 90.3%.