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Magnetron reactive ion etching of GaAs in a BCl3 discharge
Magnetron reactive ion etching of GaAs in a BCl3 discharge
1993
G. F. McLane
M. Meyyappan
H. S. Lee
Melanie W. Cole
D. W. Eckart
R. T. Lareau
M. Nararoff
J. Sasserath
Keywords:
Cavity magnetron
Reactive-ion etching
BCL3
Optoelectronics
Plasma etching
Materials science
Electric discharge
Correction
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