Characterisation of carbon nitride thin films prepared by reactive magnetron sputtering
1998
Abstract Carbon nitride (CN x ) thin films have been obtained by reactive magnetron sputtering in a pure N 2 discharge. The films have been characterised by Fourier transform infrared spectroscopy (IR), transmission electron microscopy (TEM), electron energy loss spectroscopy (EELS), X-ray photoelectron spectroscopy (XPS) and UV-vis absorption spectroscopy. A maximum value of N C = 0.5 has been achieved. Evidence is presented of the formation of a polymer-like CN x amorphous phase which contains CN, CN and CN bonds. A new peak at 286.5 eV energy loss in the C K-edge EELS spectra has been assigned to CN bonds with carbon in the sp 2 hybridisation state. Infrared spectroscopy indicates that cyanogen-like groups are present in the films and can be partially removed by thermal annealing. The contribution of CN and CN bonds has also been determined by infrared and XPS spectroscopy.
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