Polyimide-based X-ray masks with advanced performance of pattern accuracy and thermal stability

Polyimide-based X-ray masks which are generated by optical lithography and electroplating of gold absorbers on a polyimide mask membrane gain attention as low cost masks. The organic membranes generally have problem of (1) pattern edge sharpness, (2) miniaturization of pattern and (3) thermal stability. To make the masks commodity in deep and accurate lithography area, Optnics Precision, Japan, has overcome the above difficulties and realized the masks with advanced performance of pattern accuracy and thermal stability by improving the making process and the material. Good results were obtained in the exposure experiment that used this mask. When this X-ray mask is combined with the electroforming technique and the material development technique that Optnics has, the application to various fields like an industrial field and medical field can be expected.