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High index optical materials for 193 nm immersion lithography
High index optical materials for 193 nm immersion lithography
2006
Simon G. Kaplan
John H. Burnett
Eric L. Shirley
Deane Horowitz
Wilfried Clauss
Andrew Grenville
C Van Peski
Keywords:
X-ray lithography
Photolithography
Immersion lithography
Optics
Next-generation lithography
Extreme ultraviolet lithography
Materials science
optical materials
Optoelectronics
high index
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