Formation of porous metal nanosystems using direct and reverce flows of DC magnetron sputtering

The proposed work is devoted to description of two technological approaches developed in order to form porous metal nanosystems. Both of them are based on direct-current magnetron sputtering. In the first case, direct flows of DC magnetron sputtering were deposited on the substrate positioned in the front of the sputterer. In the second case, reverse flows were used and the substrate was located inside the magnetron sputterer. It has been shown experimentally, that the second technological approach gives more reproducible results as compared to the first one. In addition, usage of the reverse flows leads to significant increase in the nanosystems deposition rates.