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In-situ comparison of Si/High-K and Si/SiO2 interface properties in FD SOI MOSFETs operated at low temperature
In-situ comparison of Si/High-K and Si/SiO2 interface properties in FD SOI MOSFETs operated at low temperature
2007
L. Pham-Nguyen
C. Fenouillet-Beranger
S. Cristoloveanu
A. Vandooren
Marius K. Orlowski
G. Ghibaudo
Keywords:
High-κ dielectric
Silicon on insulator
Analytical chemistry
Materials science
In situ
Optoelectronics
Correction
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