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Reduction of Critical Dimension Difference in Litho-Etch-Litho- Etch Double Patterning Process
Reduction of Critical Dimension Difference in Litho-Etch-Litho- Etch Double Patterning Process
2015
Hao Tang
Jeffrey Shearer
Lin Lee Cheong
Nicole Saulnier
Stuart A. Sieg
Karen Petrillo
Andrew Metz
John C. Arnold
Keywords:
Materials science
Photochemistry
Critical dimension
Multiple patterning
Molecular physics
Nanotechnology
Correction
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