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Static characteristic evaluation of low-temperature deposition process for SiGeHEMT by Sputter Epitaxy Method
Static characteristic evaluation of low-temperature deposition process for SiGeHEMT by Sputter Epitaxy Method
2018
Katsumi Okubo
Yosuke Aoyagi
Motohashi Akira
Degura Kyouhei
Hirose Nobumitsu
Kasamatsu Akifumi
Matsui Toshiaki
Tsukamoto Takahiro
Suda Yoshiyuki
Keywords:
Sputtering
Epitaxy
Analytical chemistry
High-electron-mobility transistor
Materials science
low temperature deposition
Optoelectronics
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