Secondary ion mass spectrometry analysis of aluminum films: Relative sensitivity factors and analytical considerations

Relative sensitivity factors (RSFs) have been measured for 20 elements in sputter deposited aluminum films using oxygen and cesium primary beams. E+, EAl+, EO+, and EAl O+ (where E is the element) were monitored for oxygen bombardment, and E−, EAl−, ECs−, and EAl Cs− for cesium bombardment. The results follow the RSF patterns observed for other matrices. Depth resolution degradation due to nonuniform sputtering of aluminum was examined. Oxygen bombardment produced smoother craters than cesium bombardment; sputtering rate and aluminum deposition temperature were also found to affect crater topography. The effect of surface oxygen on depth profiles has also been studied.