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Simulation of High Energy E-beam Lithography for Nano-Patterning : A Development of E-beam Lithography Simulator
Simulation of High Energy E-beam Lithography for Nano-Patterning : A Development of E-beam Lithography Simulator
2004
Jinkwang Kim
Hak Joong Kim
Chanho Han
Kukjin Chun
Keywords:
Computer science
X-ray lithography
Interference lithography
Electron-beam lithography
Stencil lithography
Maskless lithography
Next-generation lithography
Optics
Computational lithography
Extreme ultraviolet lithography
Correction
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