Old Web
English
Sign In
Acemap
>
Paper
>
Ion beam studies of TiN x O y thin films deposited by reactive magnetron sputtering
Ion beam studies of TiN x O y thin films deposited by reactive magnetron sputtering
2004
E. da Silva Alves
Andrés Ramos
N.P. Barradas
F. Vaz
Paulo Monteiro Cerqueira
L. Rebouta
Ulrich Kreissig
Keywords:
Thin film
Analytical chemistry
Sputter deposition
Rutherford backscattering spectrometry
Materials science
Ion beam
Titanium nitride
Sputtering
Titanium
Ion beam deposition
Correction
Cite
Save
Machine Reading By IdeaReader
1
References
1
Citations
NaN
KQI
[]