Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography
2000
We demonstrated the fabrication of Fresnel zone plates with a 75 nm minimum feature size and circular gratings with a 20 nm minimum linewidth in polymethyl methacrylate using nanoimprint lithography, and in metals by means of a lift-off technique. Observation of sharp Moire patterns indicated the high fidelity of nanoimprint lithography in pattern duplication. Our results showed that nanoimprint lithography is a promising technology for patterning integrated optics.
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