Pore Structure and Integration Performance of a Porous CVD Ultra Low k Dielectric

Youfan Liu,Andreas Knorr,Wen-Li Wu,David Gidley,Bernd Kastenmeier

Pore Structure and Integration Performance of a Porous CVD Ultra Low k Dielectric

2005

Youfan Liu
Andreas Knorr
Wen-Li Wu
David Gidley
Bernd Kastenmeier

A porous ultra low k PECVD dielectric has been evaluated at SEMATECH for 45 nm and beyond technology node applications. Material structure, integration performance, and electrical characteristics were investigated in a one level metal single damascene integrated structure.

Keywords:

Low-k dielectric
Porosity
Composite material
Materials science
Ceramic materials

Correction
Source
Cite
Save
Machine Reading By IdeaReader

References

Citations