Controlling garnet film composition by magnetic-field-controlled radio frequency magnetron sputtering

To find a way to control the compositional change in Bi-substituted garnet during sputtering, we studied the effects of controlling the cathode magnetic field. The magnetic-field-controlled rf magnetron sputtering method that we developed can create a garnet film whose composition is the same as that of the sputtering target. When we deposited a film of Bi-substituted Dy iron garnet–ferrite (Bi2DyFe4GaO12) by this method, there was no compositional change between the target and the film even after a long sputtering process. Therefore, this sputtering method is effective at suppressing compositional change during the film formation process.