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Electrochromic WO 3 Films with Controlled High-Rate Deposition By Hollow Cathode Gas Flow Sputtering
Electrochromic WO 3 Films with Controlled High-Rate Deposition By Hollow Cathode Gas Flow Sputtering
2017
Nobuto Oka
Masahiro Watanabe
Junjun Jia
Kaoru Sugie
Yoshinori Iwabuchi
Hidefumi Kotsubo
Yuzo Shigesato
Keywords:
Sputtering
Electrochromism
Cathode
Inorganic chemistry
Mineralogy
Materials science
Flow (psychology)
Optoelectronics
Deposition (law)
high rate
Correction
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