Old Web
English
Sign In
Acemap
>
Paper
>
Deep UV Lithography for 0.35μm Design Rules Application to CMOS Technology with Three Metallization Levels
Deep UV Lithography for 0.35μm Design Rules Application to CMOS Technology with Three Metallization Levels
1994
F. Vinet
Nicolas Buffet
M. Heitzmann
M. Laurens
Ch. Le Cornec
M. Lerme
P. Molle
Y. Morand
Tobias Mourier
H. Ullmann
C. Vizioz
Keywords:
Materials science
Nanotechnology
Electronic engineering
Photolithography
CMOS
Correction
Cite
Save
Machine Reading By IdeaReader
0
References
0
Citations
NaN
KQI
[]