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Complementary use of scatterometry and SEM for photoresist profile and CD determination
Complementary use of scatterometry and SEM for photoresist profile and CD determination
2002
Yuya Toyoshima
Isao Kawata
Yasutsugu Usami
Yasuhiro Mitsui
Apo Sezginer
Eric Maiken
Kin-Chung Chan
Kenneth W. Johnson
Dean Yonenaga
Keywords:
Scanning electron microscope
Photoresist
Optics
Materials science
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