Study on synchrotron radiation lithography at BSRF

It is the excellence for fabricating microstructures with high aspect ratio and great structural height by synchrotron radiation lithography. A successive exposure method with present masks is put forward in this paper. Microstructures with thickness 2.2mm have been obtained by this method. A serial of studies of the effects on aspect ratio of mask, PMMA resist, substrate, wavelength range and dose of X rays have been processed. Microstructures with aspect ratio 104 have been obtained under optimized condition.