Change in the optical properties of amorphous films of transition metal oxides upon formation of the nanocrystalline phase

Weakly absorbing films of tantalum oxide Ta2O5 with the crystallization kinetics typical of amorphous films have been investigated. The films have been prepared by reactive magnetron sputtering on substrates of different natures (titanium and optical silica glass). The crystallization heat treatment of the films has been performed at temperatures ranging from 500 to 700 °C. Changes in the optical properties of the films in the visible range have been studied at the initial stage of the formation of nanosized nuclei. Investigations have been carried out using X-ray powder diffraction, atomic-force microscopy, and optical measurements. It has been demonstrated that a new reflecting layer with the refractive index smaller than that of the film is formed on polycrystalline substrates due to the heterogeneous nucleation of the crystalline phase at the film-substrate interface. The crystallization of the films on amorphous substrates occurs through the homogeneous mechanism and leads to a change in the transmission coefficient of the film as a result of light scattering from the nanocrystalline phase.