Pores in Tantalum Oxide Films and Their Influence on the Photoresponse

Experimental evidence is presented that indicates that HF attacks preferentially along cracks, pores, or other singularities that exist in anodic tantalum oxide films. The defects when enlarged by the HF etch permit an electrochemical emf to arise. The effects of the electrochemical emf on the photoresponse of tantalum oxide are discussed. (auth)