Hard coatings (TiN, TixAl1−xN) deposited at room temperature by energetic cluster impact

Abstract Smooth, well-adherent TiN and Ti x Al 1 − x N hard coatings were deposited at room temperature by energetic cluster impact. TiN or TiAlN clusters were produced by combining improved magnetron sputtering with reactive gas aggregation (1–4% nitrogen in argon). Ionized clusters were accelerated electrically and deposited on to a variety of substrates. The composition, morphology and microstructure of the coatings were studied by Rutherford backscattering spectroscopy, atomic force microscopy and scanning electron microscopy. By increasing the impact energy of the clusters up to 10 eV atom −1 , the surface roughness R rms could be decreased below 1 nm. The films showed no columnar structure, even though the deposition was performed at room temperature while standard physical vapour deposition methods work at around 450 °C. Mechanical properties such as adhesion and stress of the coatings will be discussed.