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Radiofrequency reactive magnetron sputtering of bismuth in an Ar/O2/CF4 plasma for photocatalytic applications.
Radiofrequency reactive magnetron sputtering of bismuth in an Ar/O2/CF4 plasma for photocatalytic applications.
2019
S. Ibrahim
Angélique Bousquet
P. Bonnet
Eric Tomasella
M. Sarakha
Thierry Sauvage
Keywords:
Nuclear chemistry
reactive magnetron
Photocatalysis
Bismuth
Sputtering
Plasma
Materials science
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