The effect of thermal treatment on the structure of tantalum oxide films grown on titanium

We have studied amorphous films of tantalum oxide deposited onto titanium substrate by reactive magnetron sputtering. Subsequent annealing at temperatures above 600°C leads to crystallization with the formation of a β-Ta2O5 phase. Thermal treatment in air results in oxidation of the substrate with the formation of a rutile modification of titanium dioxide.