Combinatorial fabrication and characterization of oxide and metal thin film composition spreads

A combinatorial fabrication method for binary composition spread and three-component composition spread thin films was developed. Any desired specific part or a complete binary/ternary diagram can be deposited onto a single substrate by sequentially ablating /sputtering target materials using a pulsed laser or an ion beam sputter. The developed deposition technique is useful for accurate determination of the structural and physical properties relations with composition in a film. The deposition technique also enables us to rapid establishing phase diagrams of binary/ternary oxide and metal thin films.