Hydrogen analysis in hydrogenated amorphous silicon thin films produced by d.c. reactive magnetron sputtering

Abstract An analysis of hydrogen incorporated into hydrogenated amorphous silicon (a-Si:H) thin films is reported. These films have been deposited by d.c. magnetron sputtering in a reactive hydrogen-argon mixture. The hydrogen incorporated in the films is studied by ERD and IR spectroscopy in order to determine the hydrogen content and hydrogen bonding configurations, respectively.