Pilot studies of the manufacturing worthiness of mixed chemistry processings in a MERIE plasma tool

This paper presents ground level feasibility study of mix-run capability on applications of metal via etches in a simulated production environment. A mini-marathon was set up to understand any particulate problems and process shift during mix-run in a MERIE plasma etch tool-a commercially available Super e chamber. Particulate, oxide and PR etch rate data will be shown to demonstrate that Super e is a production worthy etch tool for mix-run with different chemistries on metal via etch applications.