Light-absorbing layer and the layer containing layer system, to processes for its preparation and suitable for this sputtering target

Light absorbing layer systems are used for various applications such as for solar thermal applications or so-called "black matrix" layers in conjunction with liquid crystal displays. The layer or layers should therefore have a high absorption and low reflection in the visible spectral range and it should be possible to etch without the evolution of toxic substances and no particulate residue using simple dilute acids. To ensure this, the invention proposes that the light-absorbing layer on zinc and molybdenum oxide based with substoichiometric content of oxygen, wherein the proportion of molybdenum oxide - calculated as proportion of molybdenum metal in ZnO - in the range between 25 and 50 parts by weight %, said layer having an absorption index kappa greater than 0.7 at a wavelength of 550 nm.