Sputtering Property of Thin Electrolyte Film with Solid Oxide Fuel Cell Grown by Magnetic Field Control of Helicon Wave Excited Plasma

Helicon wave excited plasma (HWP) controlled by magnetic mirrors was applied to sputtering growth of a thin yttria-stabilized zirconia (YSZ) electrolyte film with solid oxide fuel cell (SOFC). Electron energy increased as increasing mirror field coil current from 4 to 15 A and its maximum value obtained at mirror field by coil current of 15 A. Furthermore, XRD intensity of (111) cubic system of a sputtered YSZ film also increased by adding magnetic mirrors. As a result, it was found that energy property of HWP and crystal structures of a sputtered YSZ film could be improved largely by reduction of particle energy losses due to the plasma confinement effect of magnetic mirrors.