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Characteristics on ITO/Cu/ITO Films Deposited by Using DC Magnetron Sputter Technology
Characteristics on ITO/Cu/ITO Films Deposited by Using DC Magnetron Sputter Technology
2014
Mijoung Kim
Youngan Chae
Hwanyeol Park
Hyonsook Kim
Deokjoon Cha
Keywords:
High-power impulse magnetron sputtering
Sputtering
Cavity magnetron
Analytical chemistry
Materials science
Optoelectronics
Correction
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