Evaluation of X-ray reflectivity of a MEMS X-ray optic

Ikuyuki Mitsuishi,Yuichiro Ezoe,Masaki Koshiishi,Makoto Mita,Yoshitomo Maeda,Noriko Y. Yamasaki,Kazuhisa Mitsuda,Takayuki Shirata,Takayuki Hayashi,Takayuki Takano,Ryutaro Maeda

Evaluation of X-ray reflectivity of a MEMS X-ray optic

2008

Ikuyuki Mitsuishi
Yuichiro Ezoe
Masaki Koshiishi
Makoto Mita
Yoshitomo Maeda
Noriko Y. Yamasaki
Kazuhisa Mitsuda
Takayuki Shirata
Takayuki Hayashi
Takayuki Takano
Ryutaro Maeda

X-ray reflectivity of an ultra light-weight X-ray optic using MEMS technologies was measured in two different energies (0.28 keV and 1.49 keV). The obtained reflectivities can be understood by considering the mirror surface structures.

Keywords:

Geometrical optics
Optoelectronics
Optical imaging
X-ray optics
Reflectivity
X-ray reflectivity
Physics
Optics
Microelectromechanical systems
X-ray
optical reflection

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