NANOSTRUCTURE OF FLUOROCARBON FILMS DEPOSITED ON POLYSTYRENE FROM HYPERTHERMAL C3F5+ IONS

Fluorocarbon films were grown on polystyrene in vacuum from 25- to 100-eV mass-selected C3F5+ ion beams. The films were analyzed by X-ray photoelectron spectroscopy, atomic force microscopy, and X-ray reflectivity after exposure to the atmosphere for 4−8 weeks. The X-ray reflectivity indicates films that range from ∼30 to 60-A thick. The thinner films form at lower ion energies, where the ion penetration depth and efficiency of film formation are lowest. X-ray reflectivity estimates air−fluorocarbon film roughness values of ∼6 A for 25- and 50-eV films but ∼20 A for the 100-eV films. The fluorocarbon−polystyrene-buried interface displays similar roughness and trends with ion energy. The AFM roughness trends are similar, but the absolute AFM roughnesses are only ∼1/4 of the X-ray reflectivity values. This discrepancy is attributed to tip effects and the method of determining roughness by AFM. The AFM images and power spectral densities of the 100-eV films displayed quasi-periodic cones spaced 300−700 A apa...