Composition and structure of NiTiCu shape memory thin films

Preliminary results on NiTiCu shape memory alloy thin-film deposition on silicon are reported. Characteristics of these films (composition, density and electrical resistivity) were correlated with working gas pressure and rf power during sputtering. The films were then annealed in order to crystallize them. The properties of these films were examined as functions of annealing and measurement temperatures in order to evidence shape memory behaviour.