EUV lithography apparatus and method for processing a mask

The invention relates to an EUV lithography apparatus (1a) comprising: an illumination device (5) for illuminating a mask (8) at an illumination position (IL) in the EUV lithography apparatus (1a), and a projection means (6) for imaging a to the mask (8) provided structure on a photosensitive substrate (12). The EUV lithography device (1a) comprises a processing device (15) for preferably spatially resolved processing of the mask (8) at a machining position (TM) in the EUV lithography apparatus (1a), and a transport device (14) for moving the mask (8) from the illumination position (IL) in the processing position (TM) on. The invention also relates to a method for processing a mask (8) in an EUV lithography apparatus (1a).