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Effect of the Interfacial SiO2 Layer on High-k Gate Stacks
Effect of the Interfacial SiO2 Layer on High-k Gate Stacks
2013
Yong Chen
Yonggen He
Hailong Liu
Guobin Yu
Jialei Liu
Zhongshan Hong
Jinhua Ni
Jingang Wu
Keywords:
High-κ dielectric
Gate oxide
Atomic physics
Materials science
gate stack
Optoelectronics
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