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Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering
Characterization of metal-oxide thin films deposited by plasma-assisted reactive magnetron sputtering
2010
Stefan Jakobs
Marc Lappschies
Uwe Schallenberg
Olaf Stenzel
Steffen Wilbrandt
Keywords:
High-power impulse magnetron sputtering
Thin film
Sputter deposition
Oxide
Plasma
Optics
Analytical chemistry
Metal
Physics
Optoelectronics
metal oxide thin films
Sputtering
reactive magnetron
Correction
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