Fundamentals of plasma and sputtering processes

Abstract Fundamental studies of plasma and sputtering processes mainly carried out in the authors' laboratories have been surveyed and discussed in the relation to the application to sputter deposited thin films. Experimental results on target, substrate and transportation phenomena have been presented. The bombarding effect by energetic particles on substrates during plasma and sputtering processes on the interface structures between sputter deposited thin films and substrates was discussed.