On matrix effects in HF-plasma-SNMS analysis of sintered ceramic Ti-Al-(Si)-O

For a series of electrically non-conductive, sin- tered ceramic samples with the nominal composition Si0.05(AlxTi1–x)0.95Oy (x being varied from 0 to 1 in steps of Δx = 0.1), the influences of elemental concentration and of the sputtering frequency in the plasma-SNMS high frequency mode on relative sensitivity factors were investigated. For Al and Ti they show strong matrix effects which may arise from the emission of positive secondary ions.