Sputtering deposition. XPS and X-ray diffraction characterization of hard nitrogen-platinum thin films

1981 
Nitrogen-platinum thin films have been prepared by reactive sputtering. The surface and the bulk of these films for which nitrogen incorporation promotes adherence and hardness, have been investigated by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), nuclear analysis and electrical measurements. The XPS data (core lines and conduction band) support the existence of a PtN x compound (x of the order of 0.1) characterized by a very limited metal to non-metal charge transfer. Concerning the XRD results, peak shifts, broadening and asymmetries have been observed and are related to the hardness improvement.
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