A MS-Windows simulation tool for synchrotron X-ray exposure and subsequent development

A prerequisite for the commercialization of the LIGA process (from the German Lithographie=Lithography, Galvanoformung=electroforming and Abformung=moulding) for the fabrication of microstructures is the availability of a simulation tool which allows the simulation of the complete lithographic process, including synchrotron source, exposure parameters and subsequent development method. The program must be highly flexible and allow for the simulation of different sources, chosen beam-line components, exposure parameters and development method independently. A simulation tool, meeting the discussed requirements, is being developed at IMT/FZK in close collaboration with LURE. For user-friendliness, a GUI (Graphical User Interface) working in a MS-Windows environment has been built, which consists of main and sub work sheets (Fig. 1). In each sub work sheet, one “set of parameters” can be defined, e.g. the development method. In this paper, we will provide a general overview of the possibilities the program offers to the user.