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Highly selective dry-plasma-free chemical etch technique for advanced patterning
Highly selective dry-plasma-free chemical etch technique for advanced patterning
2017
Subhadeep Kal
Nihar Mohanty
Richard Farrell
Cheryl Pereira
Akiteru Ko
Aelan Mosden
Peter Biolsi
Keywords:
Optoelectronics
Plasma
Physics
highly selective
Correction
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