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Lithography options for the 32nm half pitch node and beyond
Lithography options for the 32nm half pitch node and beyond
2008
Ronse
Jansen
Gronheid
Hendrickx
Maenhoudt
Goethals
Vandenberghe
Keywords:
Refractive index
Resist
Node (networking)
Lithography
Optics
Materials science
Immersion lithography
Extreme ultraviolet lithography
Correction
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