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Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System
Design of Spot Size and Optical Path in Scanning Beam Interference Lithography System
2017
王玮 Wang Wei
姜珊 Jiang Shan
宋莹 Song Ying
巴音贺希格 Bayanheshig
Keywords:
Physics
Optics
Optoelectronics
X-ray lithography
Interference lithography
Beam (structure)
Optical path
Stencil lithography
Next-generation lithography
Maskless lithography
scanning beam
Correction
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