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Integration of Block-Copolymer with Nano-Imprint Lithography: Pushing the Boundaries of Emerging Nano-Patterning Technology.
Integration of Block-Copolymer with Nano-Imprint Lithography: Pushing the Boundaries of Emerging Nano-Patterning Technology.
2012
Geoffrey L. Brennecka
David Bruce Burckel
Chu-Yeu Peter Yang
Matthew C. George
Jack Skinner
Charles A. Steinhaus
Steven R. J. Brueck
Ruichao Zhu
Alex K. Raub
Paul F. Nealey
Juan J. de Pablo
Chi-Chun Liu
Darin Q. Pike
Lance Williamson
Brandon L. Peters
Keywords:
Nanotechnology
Lithography
Nano-
Copolymer
Materials science
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