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T0401-1-4 Evaluating the Dominant Factor for Electromigration in High Purities Al Film Deposited by Sputtering
T0401-1-4 Evaluating the Dominant Factor for Electromigration in High Purities Al Film Deposited by Sputtering
2009
Xu Zhao
Masumi Saka
Mitsuo Yamashita
Fumiaki Togoh
Keywords:
Electromigration
Sputtering
Ceramic materials
Metallurgy
Materials science
dominant factor
Correction
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