High reliability of nanometer-range N/sub 2/O-nitrided oxides due to suppressing hole injection

Hole transport and trapping in N/sub 2/O-nitrided oxides have been studied. It is shown that N/sub 2/O-nitridation of oxides suppresses hole injection into the oxides. The suppression of hole injection is a mechanism leading to the enhancement of reliability of the nitrided oxides under channel hot-hole and F-N stresses.