Copper–vanadium mixed oxide thin film electrodes

Abstract In this work, small amounts of vanadium atoms were incorporated in copper oxide films in order to decrease the charge capacity loss during the electrochemical lithium reaction, mainly in the first cycle. Reactive sputtering was the film deposition technique used to deposit pure copper oxide films, CuO, and copper–vanadium mixed oxides CuO(VO y ). The composition, oxidation state and crystallinity of the deposited films were investigated. Electrochemical studies were performed, and the results demonstrated that the mixed oxides have a better electrochemical behavior with a higher capacity and stability in the charge/discharge processes, when compared to the pure CuO films behavior.