Effect of annealing temperature on properties of molybdenum disulfide thin films

The technologically significant molybdenum disulfide thin films were coated onto a non-conducting glass substrates using Automatic-CBD process. Consequences of annealed process on its physical appearance of the thin films, thickness, morphology, growth, structural and optical properties of the films were studied. The annealed sample shows an impact on the structural analysis, lattice cell, volume, average crystallite parameters. The effects of annealed temperature on the XRD pattern show that the increase of crystallite size leads to decrease in the grain boundary which will decrease in the dislocation density. Optical parameters measurement revealed that the optical band energies values of the annealed thin films lie in the range among 1.78–2.08 eV for temperature range 373–473 K. The obtained values were confirmed by photoluminesce. Surface morphology study by FE-scanning electron microscopy showed increase of grain sizes with annealing temperature. The Effect of annealed temperature on properties of thin films is discussed from the point of applications based on achieving high-performance opto-electronics and solar devices.