Characterization of the structure of the coating of multilayers using AFM and Interferometric Microscopy

Ti / TiN films were deposited on H13 steel and silicon substrates with different deposition voltage, by means of the cathodic arc evaporation (CAE) technique, this process was carried out by nanolayers deposition, requiring a detailed survey on growth films, for the properties characterization such as grain size, thickness and roughness of the film was used the atomic force microscopy (AFM) techniques and Interferometric Microscopy. Obtaining a the films growth when varying the deposition voltage.